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Vistec Electron Beam

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As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography (EBL).

Based on the Variable Shaped Beam principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research as silicon direct write, compound semiconductor, silicon photonics, mask making as well as integrated optics and several new emerging markets.

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